Atomic Layer Deposition

Principles, Characteristics, and Nanotechnology Applications

• Author(s): Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, Arthur Sherman,
• Publisher: John Wiley & Sons
• Pages: 272
• ISBN_10: 1118062779
  ISBN_13: 9781118062777
  
• Language: en
• Categories: Technology & Engineering / Materials Science / Thin Films, Surfaces & Interfaces , Technology & Engineering / Mechanical , Science / Chemistry / General ,

Description:... Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.